Micron Technology

Semiconductor Manufacturing

DryEtchProcessDevelopEngineer

$107–182k Albany, New York, United States FULL TIME Remote Friendly
Market Sentiment
HIGH DEMAND

Neural analysis suggests this role is
optimal for Mid+ candidates.

The Brief

“Dry Etch Process Develop Engineer at Micron Technology. Skills: Plasma etch optimization, Semiconductor device manufacturing. Develop dry etch unit processes. Qualify dry etch unit processes”

What You'll Achieve.

Improve critical dimension control; Improve profile; Improve selectivity; Improve uniformity; Improve defect performance; Mature processes from R&D

Industry & Context.

Semiconductor Manufacturing
Problems you'll solve

Root-cause analysis; Statistical data analysis

What They're Looking For.

Must Have

M.S. or Ph.D. in relevant field, B.S. with 3+ years semiconductor processing, Semiconductor process development experience, DOE planning/execution, Statistical data analysis, Plasma etch fundamentals knowledge, Chamber hardware knowledge, Process characterization knowledge, Collaborate effectively across teams, Communicate results clearly

Nice to Have

Hands-on advanced dry etch platforms, Chamber matching experience, Familiarity with pattern transfer challenges, Integration with lithography/hardmask stacks, Defect characterization techniques experience, Tool health monitoring methodologies experience, Experience with semiconductor equipment vendors, Joint development programs experience, R&D environments experience, Technology transfer experience, Sustaining support experience

What You'll Do.

Develop dry etch unit processes

Qualify dry etch unit processes

Sustain dry etch unit processes

Optimize critical process metrics

Drive defect reduction

Perform root-cause analysis

Implement corrective actions

Partner with equipment vendors

Document process baselines

Document change controls

Support technology transfer

How You'll Work.

Team & Collaboration

Cross-functional technical teams; Integration teams; Lithography teams; Thin films teams; CMP teams; Device teams; Manufacturing teams; EUV Photo Lithography team; Technology Development teams; Suppliers

Communication Scope

Communicate results clearly

Full Job Description

**Our vision is to transform how the world uses information to enrich life for _all_. ** Micron Technology is a world leader in innovating memory and storage solutions that accelerate the transformation of information into intelligence, inspiring the world to learn, communicate and advance faster than ever. We are part of Micron’s Technology Development organization, where advanced ideas become manufacturable technologies. Our team works at the leading edge of memory innovation, partnering across design, integration, manufacturing, and equipment suppliers to enable the next generation of semiconductor devices. This is where curiosity, experimentation, and impact come together. As a Dry Etch Process Engineer you will develop, integrate, and optimize plasma etch processes that enable next-generation memory devices. You will work hands-on with etch equipment, chamber hardware, consumables, and metrology, using data-driven methods to improve critical dimension control, profile, selectivity, uniformity, and defect performance. You will collaborate closely with integration, lithography, thin films, CMP, device, and manufacturing teams to mature processes from R&D into high-volume manufacturing. This role is full time at the NYC site in Albany, New York. You will collaborate with our EUV Photo Lithography process team in NYC, and our Technology Development (TD) teams in Boise, USA and Hiroshima, Japan sites to develop robust dry etch solutions aligned to Micron’s technical roadmap. NYC is a diverse consortium, and you will have many opportunities to work closely with suppliers and other companies while protecting Micron’s intellectual property (IP). **Responsibilities:** * Develop, qualify, and sustain dry etch (plasma) unit processes for advanced memory technologies (e.g., dielectric, conductor, and hardmask etch) * Optimize critical process metrics including CD control, etch profile/anisotropy, selectivity, microloading, uniformity, and line edge/line width roughness * D

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